1. What Is the Positive Photoresist Market?
The Positive Photoresist Market comprises the global production, distribution, and end-use application of light-sensitive polymer formulations in which exposed areas become soluble in developer solution following ultraviolet, deep ultraviolet, or extreme ultraviolet irradiation, enabling the patterning of circuit features in semiconductor integrated circuit fabrication, flat panel display manufacturing, and printed circuit board production. The market includes novolak-based g-line and i-line positive photoresists for conventional semiconductor, power device, and PCB applications, chemically amplified positive photoresists for deep UV exposure at 248nm and 193nm wavelengths for advanced logic and memory semiconductor nodes, EUV-compatible chemically amplified positive resists for extreme ultraviolet lithography at sub-7nm technology nodes, and display-grade positive photoresists for thin film transistor and color filter patterning in LCD and OLED panel production. These products serve semiconductor foundry operators requiring high-resolution positive photoresist for chip fabrication at advanced and mature process nodes, power semiconductor device manufacturers using thicker positive resist for high-voltage device definition, display panel producers using positive photoresist for flat panel patterning, and printed circuit board manufacturers using positive resist for PCB trace and pad definition. The market covers all commercial positive photoresist formulations across semiconductor, display, and printed circuit board manufacturing applications, excluding negative-tone photoresists, dry film photoresists for PCB, and EUV photoresist marketed as a separate advanced product category.
2. Positive Photoresist Market Size & Forecast
3. Emerging Technologies
- Chemically amplified positive photoresist formulation advances using novel photoacid generator chemistry with improved acid diffusion control are advancing to enable tighter line edge roughness and line width roughness in 193nm immersion multi-patterning at sub-10nm half-pitch dimensions required for leading-edge logic device fabrication. Growing adoption of improved PAG chemistry at foundry qualification programs is being driven by the patterning quality improvement achievable at extreme multi-patterning depths where acid diffusion control is the primary limiting factor for feature edge sharpness.
- Metal oxide photoresist materials providing higher EUV photon absorption efficiency than conventional polymer-based positive resists are advancing for EUV lithography applications at sub-5nm technology nodes where photon shot noise limitations of conventional resist require higher photosensitivity to achieve defect-free patterning at production throughput. Continued development of metal-organic EUV resist chemistry is enabling leading-edge chipmakers to achieve higher EUV lithography throughput by reducing exposure dose requirements at minimum defect density.
- Positive photoresist development process optimization using reduced developer concentration and surfactant-enhanced rinse chemistry is advancing to minimize micro-bridging and pattern collapse defects in high-aspect-ratio features at sub-20nm dimensions where capillary forces during wet development cause structural failure. Growing adoption of optimized development process chemistry at advanced node foundry lines is being driven by the yield improvement from reduced pattern collapse defects in high-density memory and logic cell layouts.
- Digital photoresist process monitoring using scatterometry-based in-situ resist profile measurement and real-time process control feedback is scaling as a lithography quality management tool at leading-edge semiconductor fabs. Growing adoption among advanced node foundry operators is being driven by the wafer yield improvement from real-time resist profile control that detects develop-process variation before it propagates to downstream etch and deposition steps.
Such innovations are driving change across adjacent industries too. Discover more in our Industrial Gases Market.
4. Key Market Opportunity
One of the major opportunities in the Positive Photoresist Market is the growing demand for high-performance EUV-compatible positive chemically amplified resists that can achieve the combination of high EUV photon sensitivity, low line edge roughness, and sub-5nm half-pitch resolution required for leading-edge logic semiconductor fabrication at extreme ultraviolet lithography production throughputs. A structural gap exists between current positive EUV photoresist performance in sensitivity and line edge roughness and the simultaneous optimization of both properties required for cost-competitive high-volume EUV production at 3nm and below, where the fundamental physics of photon shot noise create competing requirements between sensitivity and patterning precision. Investment in EUV photoresist chemistry from metal oxide platforms, non-chemically amplified resist alternatives, and advanced photoacid generator development is creating innovation pathways toward positive resist formulations that meet the simultaneous sensitivity and resolution requirements for advanced EUV-intensive lithography. Specialty photoresist companies and established resist producers that achieve leading-edge EUV positive resist qualification at major foundry customers are positioned to capture a high-margin and supply-critical role in the semiconductor materials supply chain as EUV multi-patterning adoption expands across the industry.
5. Top Companies in the Positive Photoresist Market
The following organisations hold leading positions in the Positive Photoresist Market. The full report provides revenue share, SWOT analysis, and competitive benchmarking for each player.
- JSR Corporation
- Tokyo Ohka Kogyo (TOK)
- Shin-Etsu Chemical
- Fujifilm Holdings (Electronic Materials)
- DuPont Electronics
- Merck KGaA (Electronics)
- Sumitomo Chemical
- AZ Electronic Materials (Merck)
- Dongjin Semichem
- SK Materials
- SACHEM
- EMD Electronics
- Arch Chemicals
6. Market Segmentation
The Positive Photoresist Market is analysed across 4 segmentation dimensions. Revenue data, growth rates, and competitive intensity by sub-segment are available in the full report.
| Segmentation | Sub-Segments |
|---|---|
| By Type | Novolak g-line and i-line Chemically Amplified 248nm Chemically Amplified 193nm Chemically Amplified 193nm Immersion EUV-Compatible Positive |
| By Application | Semiconductor IC Fabrication Power Semiconductor Flat Panel Display Printed Circuit Board MEMS and Sensors |
| By Technology Node | Advanced Node sub-7nm Mature Node 28nm-130nm Legacy Node above 130nm |
| By Geography | North America Europe Asia Pacific Latin America Middle East and Africa |
7. Key Market Trends (2026–2034)
Three major forces are shaping the Positive Photoresist Market trajectory over the forecast period:
Advanced Node Semiconductor Capacity Expansion Is Creating Growing Demand for Chemically Amplified 193nm Immersion Positive Photoresist.Semiconductor foundries constructing new advanced node fabrication facilities under national chip program incentives in the United States, Europe, Japan, and South Korea are increasing chemically amplified positive photoresist procurement for high-volume production of leading-edge logic and memory devices at 7nm, 5nm, and 3nm process nodes using multi-patterning 193nm immersion lithography. TSMC and Samsung Electronics expanded positive photoresist procurement agreements with JSR Corporation and Tokyo Ohka Kogyo in 2024 for advanced node capacity additions at Arizona and Korean fabrication sites, securing multi-year supply of qualified chemically amplified positive resist.
Mature Node Semiconductor Capacity Additions for Power Devices and Automotive Chips Are Growing Demand for g-line and i-line Positive Photoresist.Power semiconductor, analog, and automotive microcontroller producers constructing new mature node fabrication capacity for electric vehicle power electronics, industrial automation chips, and connectivity semiconductors are increasing novolak-based g-line and i-line positive photoresist procurement for 90nm-250nm process node device fabrication. ON Semiconductor and STMicroelectronics expanded mature node positive photoresist procurement in 2024 for silicon carbide and silicon power device fabrication facilities constructing in Asia and Europe to serve growing EV and industrial power electronics demand.
Flat Panel Display Capacity Additions in Asia Are Creating Growing Demand for Display-Grade Positive Photoresist in Panel Production.Display panel manufacturers in China and South Korea are adding OLED and LCD flat panel display production capacity to serve growing consumer electronics and television market demand, increasing positive photoresist procurement for thin film transistor layer and color filter patterning in high-resolution display panel fabrication at new facilities. LG Display and BOE Technology expanded display-grade positive photoresist procurement in 2024 for LCD and OLED panel fabrication facilities constructing in Korea and China, securing multi-year supply agreements aligned with new panel production ramp schedules.
For related market intelligence, see the Specialty Gases Market.
8. Segmental Analysis
By type, the Chemically Amplified 193nm Immersion segment dominated the Positive Photoresist Market in 2025, reflecting its position as the workhorse lithography process for high-volume production of advanced logic and memory devices at 7nm to 20nm technology nodes using multi-patterning exposure strategies, driven by the established qualification history at leading foundry customers, process tool compatibility, and process cost per wafer layer advantage of 193nm immersion relative to EUV for established multi-patterning applications. 193nm immersion positive resist generates the largest volume of any single photoresist type in semiconductor manufacturing through continuous use across multiple patterning passes per device layer at advanced technology nodes. The EUV-Compatible Positive segment is the fastest-growing type, driven by expanding EUV lithography adoption at sub-7nm advanced logic and DRAM memory manufacturing where single-exposure EUV patterning reduces multi-patterning complexity and mask count relative to 193nm immersion multi-patterning, increasing EUV resist volume per wafer at leading-edge chip fabrication facilities. Growing EUV scanner installation at leading foundry and memory producers is creating accelerating demand for qualified EUV-compatible positive photoresist.
By application, the Semiconductor IC Fabrication segment dominated the Positive Photoresist Market in 2025, reflecting the dominant consumption volume driven by continuous high-volume use of positive photoresist across dozens of patterning layers in the fabrication of advanced logic, DRAM, and NAND flash memory devices at leading-edge and mid-node semiconductor manufacturing facilities globally, driven by the multi-layer patterning process structure required at every technology node from advanced to mature that creates high photoresist consumption per wafer. Semiconductor IC fabrication creates consistent high-volume positive photoresist demand through continuous multi-layer patterning requirements. The Power Semiconductor segment is the fastest-growing application, driven by accelerating production of silicon carbide and gallium nitride power semiconductor devices for electric vehicle inverters, industrial motor drives, and renewable energy conversion where new power device fabrication capacity is constructing at specialized semiconductor fabs requiring positive photoresist for high-voltage junction and contact layer definition.
9. Regional Analysis
Regional demand patterns across the Positive Photoresist Market reflect differences in regulation, technological maturity, and capital investment.
Largest Market Share
Asia Pacific dominated the Positive Photoresist Market in 2025, with a market share of 52.3%. Semiconductor foundry operators in Taiwan, South Korea, Japan, and China are generating the region's dominant positive photoresist consumption through high-volume use of chemically amplified 193nm immersion and mature node novolak positive resists at leading-edge and established-node semiconductor fabrication facilities producing integrated circuits for global electronics supply chains. Display panel manufacturers in China and South Korea are creating large-volume demand for display-grade positive photoresist at LCD and OLED panel production lines fabricating panels for consumer electronics and television markets. Mature node power semiconductor and analog device fabrication facilities in China and Southeast Asia are increasing positive photoresist procurement for electric vehicle power electronics, consumer appliance control chips, and industrial automation device production.
Highest CAGR Region
North America is expected to register the highest CAGR of 10.20% during the forecast period. Advanced node semiconductor fabrication facilities constructing under CHIPS and Science Act incentive programs in the United States are increasing chemically amplified positive photoresist procurement for 5nm and 3nm logic device production at new Arizona, New York, and Ohio fabrication sites. Specialty semiconductor device manufacturers and defense electronics chip producers in the United States are increasing positive photoresist procurement for secure domestic chip production in analog, power, and specialty logic device fabrication. EUV-compatible positive photoresist evaluation and qualification programs at new advanced node semiconductor fabs are creating growing procurement demand for high-performance positive EUV resist from domestic and allied-nation suppliers.
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Frequently Asked Questions
The Positive Photoresist Market was valued at USD 3.13 Bn in 2025 and is projected to reach USD 6.00 Bn by 2034, growing at a CAGR of 7.50% over the 2026–2034 forecast period.
The Positive Photoresist Market is projected to grow at a CAGR of 7.50% from 2026 to 2034.
Asia Pacific dominated the Positive Photoresist Market in 2025, with a market share of 52.3%.
The leading companies in the Positive Photoresist Market include JSR Corporation, Tokyo Ohka Kogyo (TOK), Shin-Etsu Chemical, Fujifilm Holdings (Electronic Materials), DuPont Electronics, Merck KGaA (Electronics), Sumitomo Chemical, AZ Electronic Materials (Merck), Dongjin Semichem, SK Materials, SACHEM, EMD Electronics, Arch Chemicals.
Advanced node semiconductor capacity expansion is creating growing demand for chemically amplified 193nm immersion positive photoresist.
By type, the Chemically Amplified 193nm Immersion segment dominated the Positive Photoresist Market in 2025, reflecting its position as the workhorse lithography process for high-volume production of advanced logic and memory devices at 7nm to 20nm technology nodes using multi-patterning exposure strategies, driven by the established qualification history at leading foundry customers, process tool compatibility, and process cost per wafer layer advantage of 193nm immersion relative to EUV for established multi-patterning applications.
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